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Muhimmancin Tashin Hankali na Monomer don Aikin Inks na Litho Mai Warkewa na UV

A cikin shekaru 20 da suka gabata, an yi amfani da tawada mai warkar da UV sosai a fannin tawada ta lithographic. A cewar wasu binciken kasuwa,[1,2] tawada mai warkar da radiation ana hasashen za ta ji daɗin karuwar kashi 10 cikin ɗari.

Wannan ci gaban kuma ya faru ne sakamakon ci gaba da aka samu a fasahar buga littattafai. Sabbin ci gaba a fannin injinan buga littattafai (injinan da aka yi wa fenti da na'urorin yanar gizo dangane da samar da kayayyaki masu sauri da kuma na'urorin yin tawada/damping) da kayan aiki masu busarwa (bargon nitrogen da fitilun sanyi) sun haifar da karuwar yawan amfani da su a masana'antar zane-zane, ciki har da akwatunan kayan kwalliya, abinci, taba, giya, nau'ikan kasuwanci, wasiku kai tsaye, tikitin caca da katunan kuɗi.

Tsarin tawada mai gogewa ta UV ya dogara ne akan abubuwa da yawa masu canzawa. A cikin wannan takarda, mun yi ƙoƙarin nuna rawar da yanayin monomer yake takawa a cikin girke-girke na tawada. Mun yi cikakken bayanin monomers dangane da tashin hankali tsakanin fuska domin mu hango halayensu da ruwa a cikin tsarin lithographic.

Bugu da ƙari, an ƙera tawada da waɗannan monomers kuma an kwatanta kaddarorin da aka yi amfani da su a ƙarshe.

Duk monomers da aka yi amfani da su a binciken samfuran Cray Valley ne. An haɗa monomers ɗin GPTA ne domin canza alaƙarsu da ruwa.

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Lokacin Saƙo: Satumba-19-2025